Brave C&H of Taiwan recently has succeeded in applying polymide (PI) material on screen producing, which will enable it to regain competiveness on the PV cell-manufacturing market. The breakthrough is a timely boon for the company, which has been plagued by problems of using photo emulsion for screen printing. The printing quality of a screen is affected by the screen’s knot design, the compatibility of the screen with emulsion, and its compatibility with conductive pastes.
Chen Kan-Fu, general manager of Brave C&H, pointed out that due to the limited amount in need it was unable to secure competitive photosensitive emulsion from foreign suppliers. The company started to conduct R&D on PI material four years ago, in order to offset the advantage of rivals who possess strong photosensitive-emulsion technology.
To enhance efficiency and offset the impact of China's new 531 policy, players in the field have rushed to introduce selective emitter (SE) technology, which is known to have lower power resistance and higher efficiency. However, traditional knotless screen printing cannot be coupled with SE process, which has eventually forced players to switch to fine-line printing.